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Imazono, Takashi; Suzuki, Yoji; Sano, Kazuo*; Koike, Masato
Spectrochimica Acta, Part B, 65(2), p.147 - 151, 2010/02
Times Cited Count：2 Percentile：14.55(Spectroscopy)To meet the needs we have been developing an apparatus to evaluate polarization abilities of multilayer- and crystal-types polarizing elements and determine the polarization state of light in 1 keV region. The 8-axis goniometer called the polarization analysis-unit is equipped in this apparatus and consists of a phase shifter-unit and an analyzer-unit. All axes can be driven with HV compatible stepping motors. Both reflection- and transmission-types samples are available on P and A. Therefore, this apparatus makes it possible to carry out not only conventional reflection and transmission measurements but also four scanning modes which are double- reflections and transmissions, and transmission-reflection and vice versa.
Koike, Masato; Ishino, Masahiko; Imazono, Takashi; Sano, Kazuo*; Sasai, Hiroyuki*; Hatayama, Masatoshi*; Takenaka, Hisataka*; Heimann, P. A.*; Gullikson, E. M.*
Spectrochimica Acta, Part B, 64(8), p.756 - 760, 2009/08
Times Cited Count：9 Percentile：42.89(Spectroscopy)W/C and Co/SiO
multilayer laminar-type holographic plane gratings (groove density 1/1200 lines /mm) in the 1-8 keV region are developed. For the Co/SiO grating the diffraction efficiencies of 0.41 and 0.47 at 4 and 6 keV, respectively, and for the W/C grating 0.38 at 8 keV are observed. Taking advantage of the outstanding high diffraction efficiencies into practical soft X-ray spectrographs a Mo/SiO multilayer varied-line-spacing (VLS) laminar-type spherical grating (1/2400 lines /mm) is also developed for use with a flat field spectrograph in the region of 1.7 keV. For the Mo/SiO multilayer grating the diffraction efficiencies of 0.05-0.20 at 0.9-1.8 keV are observed. The FWHM's of the measured line profiles of Hf-M
(1644.6 eV), Si-K (1740.0 eV),and W-M (1775.4 eV) are 13.7 eV, 8.0 eV, and 8.7 eV, respectively. It shows the validity of multilayer lamina-type gratings in the region.
Koike, Masato; Ishino, Masahiko; Imazono, Takashi; Sano, Kazuo*; Sasai, Hiroyuki*; Hatayama, Masatoshi*; Takenaka, Hisataka*; Heimann, P. A.*; Gullikson, E. M.*
no journal, ,
A multilayer laminar-type holographic grating having an average groove density of 2400 lines/mm was designed and fabricated for use with a soft X-ray flat field spectrograph covering the 0.70-0.75 nm region. A varied-line-spacing grooves pattern is generated by the use of an aspheric wavefront recording system and laminar-type grooves are formed by a reactive ion-etching method. Mo/SiO multilayers optimized for the emission bands of hafnium M, silicon K, and tungsten M are deposited on one of the three designated areas on the grating surface in tandem. The measured first-order diffraction efficiencies at the respective centers of the areas are 18-20 percent. A flat field spectrograph equipped with the grating indicates a spectral line width of 8-14 eV for the emission spectra generated from an electron-impact X-ray sources.
